发明名称 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE: A positive photosensitive resin composition, a photoresist resin film using thereof, and a semiconductor device including thereof are provided to improve mechanical property and heat resistance of the film while maintaining high sensitivity and high definition. CONSTITUTION: A positive photosensitive resin composition contains 100 parts of polyimide-polybenzoxazole alternating copolymer precursor by weight, 5~100 parts of photo sensitive diazoquinone compound by weight, 0,1~30 parts of silane compound by weight, 1~30 parts of phenolic compound by weight, and 200~900 parts of solvent by weight.
申请公布号 KR20100055243(A) 申请公布日期 2010.05.26
申请号 KR20080114223 申请日期 2008.11.17
申请人 CHEIL INDUSTRIES INC. 发明人 JUNG, DOO YOUNG;CHO, HYUN YONG;JEONG, JI YOUNG;CHUNG, MIN KOOK;LEE, JONG HWA;YOO, YONG SIK;LEE, KIL SUNG
分类号 G03F7/039 主分类号 G03F7/039
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