发明名称 |
POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE: A positive photosensitive resin composition, a photoresist resin film using thereof, and a semiconductor device including thereof are provided to improve mechanical property and heat resistance of the film while maintaining high sensitivity and high definition. CONSTITUTION: A positive photosensitive resin composition contains 100 parts of polyimide-polybenzoxazole alternating copolymer precursor by weight, 5~100 parts of photo sensitive diazoquinone compound by weight, 0,1~30 parts of silane compound by weight, 1~30 parts of phenolic compound by weight, and 200~900 parts of solvent by weight. |
申请公布号 |
KR20100055243(A) |
申请公布日期 |
2010.05.26 |
申请号 |
KR20080114223 |
申请日期 |
2008.11.17 |
申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
JUNG, DOO YOUNG;CHO, HYUN YONG;JEONG, JI YOUNG;CHUNG, MIN KOOK;LEE, JONG HWA;YOO, YONG SIK;LEE, KIL SUNG |
分类号 |
G03F7/039 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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