发明名称 |
METHOD FOR MANUFACTURING PHOTOVOLTAIC DEVICE |
摘要 |
<p>Provided is a method for manufacturing a photovoltaic device which is capable of easily forming a texture having an aspect ratio larger than 0.5. The method for manufacturing a photovoltaic device include the steps of: forming an etching-resistant film on a silicon substrate; forming a plurality of fine holes in the etching-resistant film with an irradiated laser beam which has a focal depth adjusted to 10 µm or more to expose a surface of the silicon substrate which is a base layer; and etching the exposed surface of the silicon substrate, in which the step of exposing the surface of the silicon substrate includes forming a fine recess at a concentric position to each of the fine holes in the surface of the silicon substrate which lies under the etching-resistant film.</p> |
申请公布号 |
EP2190026(A1) |
申请公布日期 |
2010.05.26 |
申请号 |
EP20070850945 |
申请日期 |
2007.12.20 |
申请人 |
MITSUBISHI ELECTRIC CORPORATION |
发明人 |
NISHIMURA, KUNIHIKO;MATSUNO, SHIGERU |
分类号 |
H01L31/0236;H01L31/18 |
主分类号 |
H01L31/0236 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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