| 摘要 |
This invention provides a positive-working photosensitive composition, which, in not only ordinary exposure (dry exposure) but also liquid immersion exposure, is wide in exposure latitude and has suppressed line edge roughness, a method for pattern formation using the positive-working photosensitive composition, and a novel resin containing the positive-working photosensitive composition. The positive-working photosensitive composition comprises (A) a resin, which has a specific lactone structure on its side chain and undergoes an increase in solubility in an alkali developing solution upon the action of an acid, and (B) a compound which generates an acid upon exposure to an actinic radiation or a radiation. |
