发明名称 |
Plasma processing apparatus |
摘要 |
The purpose of the present invention is to provide homogeneous plasma in longitudinal direction of a plasma processing apparatus applicable to multiple processes. A microwave waveguide 10 with a plurality of variable couplers 12 is placed in a vacuum chamber 21. The microwave generated in a microwave generator 23 is introduced into the microwave waveguide 10 via a waveguide 24. And a plasma 22 in the chamber 21 is generated by the microwave 25. Intensity distribution of the microwave 25 in the microwave waveguide 10 can be varied by moving a plurality of variable couplers 12 individually upward or downward as shown by two-way arrow.
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申请公布号 |
US7723637(B2) |
申请公布日期 |
2010.05.25 |
申请号 |
US20060592253 |
申请日期 |
2006.11.03 |
申请人 |
TOHOKU UNIVERSITY;FUTURE VISION INC. |
发明人 |
OHMI TADAHIRO;HIRAYAMA MASAKI;HORIGUCHI TAKAHIRO |
分类号 |
B23K10/00 |
主分类号 |
B23K10/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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