| 摘要 |
PURPOSE: A substrate processing apparatus is provided to easily monitor the inside of a process chamber by forming a chamber cover window made of a transparent material. CONSTITUTION: A processing chamber(120) provides a space for a preset process. A chemical spray unit sprays the chemical on the substrate inside a process chamber. A chamber cover(180) covers the process chamber and includes a cover window for monitoring the inside of the process chamber and a gas spray unit for removing the chemical fume remaining on the cover window by spraying the gas to the surface of the cover window.
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