发明名称 Capacitor of Semiconductor Device and Method for Manufacturing Thereof
摘要 A capacitor includes a first lower metal layer and an insulating layer on a lower interlayer dielectric layer of a semiconductor substrate; a first upper metal layer aligned on the insulating layer to partially expose it; a first capping layer and an upper interlayer dielectric layer on the insulating layer including the first upper metal layer; a second lower metal layer connected to the first upper metal layer through the upper interlayer dielectric layer and the first capping layer; a second capping layer aligned on the upper interlayer dielectric layer including the second lower metal layer and formed with a hole for partially exposing the second lower metal layer; a pad aligned on the second capping layer and connected to the second lower metal layer; a protective layer on the second capping layer; and a second upper metal layer aligned on the second capping layer.
申请公布号 KR100959445(B1) 申请公布日期 2010.05.25
申请号 KR20070131943 申请日期 2007.12.17
申请人 发明人
分类号 H01L27/108;H01L21/8242 主分类号 H01L27/108
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