| 摘要 |
A line image acquisition apparatus suitable for being added onto a line-scan wafer macro-inspection system which incorporates oblique incidence illumination and detection, both for brightfield and for darkfield, which incorporates double darkfield observation capability, which incorporates broadly tunable angle of incidence illumination and tunable angle of detection, which incorporates multi-channel detection into a line-scan macro-inspection system, and which is an add-on feature compatible with current line-scan macro-inspection systems.
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