发明名称 |
FINE PATTERNING METHOD OF INKJET BY FORMING GUIDE LINE OF SELF ASSEMBLED MONOLAYER |
摘要 |
<p>PURPOSE: A fine patterning method of an inkjet by forming a guide line of a self assembled monolayer is provided to prevent a solid from spreading around a pattern by forming a self assembled monolayer as a guide line in forming the pattern. CONSTITUTION: In a fine patterning method of an inkjet by forming a guide line of a self assembled monolayer, a guide line is formed on a substrate with an SAM layer is formed(ST1). An ink jet pattern is formed between guide-lines(ST2). The SAM layer has different selectivity since the SAM layer has hydrophilic property, and hydrophobicity against the ink of the inkjet.</p> |
申请公布号 |
KR20100054424(A) |
申请公布日期 |
2010.05.25 |
申请号 |
KR20080113352 |
申请日期 |
2008.11.14 |
申请人 |
KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
发明人 |
JU, BYEONG KWON;YOON, HO GYU;HUH, JIN WOO;KWON, DAE HONG |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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