发明名称 FINE PATTERNING METHOD OF INKJET BY FORMING GUIDE LINE OF SELF ASSEMBLED MONOLAYER
摘要 <p>PURPOSE: A fine patterning method of an inkjet by forming a guide line of a self assembled monolayer is provided to prevent a solid from spreading around a pattern by forming a self assembled monolayer as a guide line in forming the pattern. CONSTITUTION: In a fine patterning method of an inkjet by forming a guide line of a self assembled monolayer, a guide line is formed on a substrate with an SAM layer is formed(ST1). An ink jet pattern is formed between guide-lines(ST2). The SAM layer has different selectivity since the SAM layer has hydrophilic property, and hydrophobicity against the ink of the inkjet.</p>
申请公布号 KR20100054424(A) 申请公布日期 2010.05.25
申请号 KR20080113352 申请日期 2008.11.14
申请人 KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION 发明人 JU, BYEONG KWON;YOON, HO GYU;HUH, JIN WOO;KWON, DAE HONG
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址