发明名称 |
Observation method with electron beam |
摘要 |
For the purpose of repeatedly observing the bottom of a contact hole with a high aspect ratio, the potential of an electrostatic charge in each of a pattern to be observed and a vicinity of a range to be observed is stabilized by pre-charging a range on which to irradiate a beam of electrons while changing the range on a step-by-step basis.
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申请公布号 |
US7723681(B2) |
申请公布日期 |
2010.05.25 |
申请号 |
US20070871687 |
申请日期 |
2007.10.12 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
OJIMA YUKI;IWAMA SATORU;IKEGAMI AKIRA |
分类号 |
G01N23/04 |
主分类号 |
G01N23/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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