发明名称 Observation method with electron beam
摘要 For the purpose of repeatedly observing the bottom of a contact hole with a high aspect ratio, the potential of an electrostatic charge in each of a pattern to be observed and a vicinity of a range to be observed is stabilized by pre-charging a range on which to irradiate a beam of electrons while changing the range on a step-by-step basis.
申请公布号 US7723681(B2) 申请公布日期 2010.05.25
申请号 US20070871687 申请日期 2007.10.12
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 OJIMA YUKI;IWAMA SATORU;IKEGAMI AKIRA
分类号 G01N23/04 主分类号 G01N23/04
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