LITHOGRAPHIC APPARATUS AND METHODS FOR COMPENSATING SUBSTRATE UNFLATNESS, DETERMINING THE EFFECT OF PATTERNING DEVICE UNFLATNESS, AND DETERMING THE EFFECT OF THERMAL LOADS ON A PATTERNING DEVICE.,申请号NL20092003673-传众专利搜索

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发明名称	LITHOGRAPHIC APPARATUS AND METHODS FOR COMPENSATING SUBSTRATE UNFLATNESS, DETERMINING THE EFFECT OF PATTERNING DEVICE UNFLATNESS, AND DETERMING THE EFFECT OF THERMAL LOADS ON A PATTERNING DEVICE.
摘要
申请公布号	NL2003673(A)	申请公布日期	2010.05.25
申请号	NL20092003673	申请日期	2009.10.20
申请人	ASML NETHERLANDS B.V.,	发明人	BIJVOET, DIRK-JAN
分类号	G03F7/20;G03F9/00	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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