发明名称 Memory cells and semiconductor memory device using the same
摘要 Memory cells and semiconductor memory devices using the same. A substrate comprises two cross-coupled inverters and first and second pass-gate transistors formed therein, the inverters having a data storage node and a date bar storage node coupled to first terminals of the first and second pass-gate transistors. A first conductive layer is disposed on the substrate and comprises a bit line and a complementary bit line electrically connected to second terminals of the first and second pass-gate transistors respectively. A second conductive layer is disposed on the first conductive layer and comprises two first power lines covering the bit line and the complementary bit line respectively, wherein the first power lines, the bit line and the complementary bit line are parallel.
申请公布号 US7723806(B2) 申请公布日期 2010.05.25
申请号 US20060390707 申请日期 2006.03.28
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LIAW JHON-JHY
分类号 H01L29/76 主分类号 H01L29/76
代理机构 代理人
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