发明名称 |
PATTERNING METHOD USING PATTERN OF SELF ASSEMBLED MONOLAYER |
摘要 |
<p>PURPOSE: A patterning method using pattern of a self assembled monolayer is provided to form a pattern with simple by performing dip coating, Spin coating, Casting, and spraying through a material to be pattern under a creation condition for a certain time. CONSTITUTION: In a patterning method using pattern of a self assembled monolayer, a pattern is formed in a substrate(10) with a SAM layer(30). A pattern which is formed with the SAM layer is coated. The SAM layer has a selectivity since the SAM layer has different hydrophilic property and hydrophobicity against the material to be pattern on the substrate.</p> |
申请公布号 |
KR20100054436(A) |
申请公布日期 |
2010.05.25 |
申请号 |
KR20080113369 |
申请日期 |
2008.11.14 |
申请人 |
KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
发明人 |
JU, BYEONG KWON;YOON, HO GYU;HUH, JIN WOO;KWON, DAE HONG;JEONG, JIN WOOK |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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