发明名称 |
Disposal device for pollutants |
摘要 |
The invention relates to inlet elements at disposal devices for process exhaust gases containing pollutants, as are produced in particular in semiconductor component fabrication. The solution is intended to make it possible to avoid deposits in the inlet region for process exhaust gases at disposal devices. To achieve this object, the inlet elements according to the invention are designed in such a way that a porous, gas-permeable wall element, via which an inert gas can be fed into the interior of the inlet element routing process exhaust gas, is present at the inlet element.
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申请公布号 |
US7722826(B2) |
申请公布日期 |
2010.05.25 |
申请号 |
US20040937934 |
申请日期 |
2004.09.10 |
申请人 |
DAS-DUNNSCHICHT ANLAGEN SYSTEME GMBH |
发明人 |
WIESENBERG WIDO;WIESENBERG RALPH;RITTER TILMANN;FRENZEL ANDREAS |
分类号 |
B01D53/34;B01J10/00;B01D50/00;B01J4/00;B01J12/00;B01J14/00;F01N3/00;F01N3/08;F23D3/40;F23G7/06;F23J11/00;F23L7/00 |
主分类号 |
B01D53/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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