| 摘要 |
<p>PURPOSE: An imprint apparatus is provided to form a fine pattern easily by preventing the semi-contact state between a nano-material film and a soft mold informing the fine pattern. CONSTITUTION: A back- plane fixing unit holds the back- plane(41) within a chamber. An up-down driver moves the back-plane fixing unit up and down. A substrate in which the liquid polymer(54) is formed is loaded in a stage. A z-axis driving unit drives the stage in the z-axis direction. A pressing plate(61) is separated from the back-plane by a certain distance and is contacted with the bottom of the back-plane when the z-axis driving unit is operated.</p> |
