PULSED LASER DEPOSITION APPARATUS WITH SEPERATED DEPOSITION CHAMBER

摘要

PURPOSE: A pulse-laser deposition apparatus with a detachable deposition chamber is provided to produce thin films and nano rods of high purity by changing the kind of atmospheric gas or individually controlling atmospheric gas. CONSTITUTION: A pulse-laser deposition apparatus(100) comprises a laser generator(160), a plasma generation chamber(110), a deposition chamber(120), and a pump(150). The laser generator generates pulse laser which is irradiated to a target inside the plasma generation chamber. The plasma generation chamber has a space in which active species are formed. Active species are deposited on a substrate inside the deposition chamber. The pump forms a pressure so that the active species are carried to the substrate within the deposition chamber.