| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the radiated projection beam passes. <P>SOLUTION: This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT |
