| 摘要 |
PROBLEM TO BE SOLVED: To provide a laminated transparent conductive film which is produced by laminating a zinc oxide-based conductive film and an indium oxide-based transparent conductive film, and has low resistance and is excellent in moisture resistance or chemical resistance. SOLUTION: The laminated transparent conductive film is produced by laminating on a substrate, a transparent conductive film layer (A) comprising zinc oxide as a main component and a similar film layer (B) comprising indium oxide as a main component in this order. The film layer (B) has an amorphous structure. The production of such a laminated transparent conductive film can be attained by performing the film deposition of the film layer (A) using a sputtering method at ultimate vacuum of 1×10<SP>-4</SP>to 1.013×10<SP>5</SP>Pa. COPYRIGHT: (C)2010,JPO&INPIT |
