发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <p>An object is to provide a projection optical system, for example, capable of improving the throughput of scanning exposure in application to scanning exposure apparatus. A projection optical system (PL) for forming an image of a first surface (Ma) and an image of a second surface (Mb) on a third surface (W) comprises a first imaging optical system (G1), a second imaging optical system (G2), a third imaging optical system (G3), a fourth imaging optical system (G4), a fifth imaging optical system (G5), a sixth imaging optical system (G6), a seventh imaging optical system (G7), a first folding member (FM: R37) disposed between the third imaging optical system and the seventh imaging optical system, and a second folding member (FM: R67) disposed between the sixth imaging optical system and the seventh imaging optical system.</p>
申请公布号 WO2010055739(A1) 申请公布日期 2010.05.20
申请号 WO2009JP67314 申请日期 2009.09.29
申请人 NIKON CORPORATION;OHMURA, YASUHIRO 发明人 OHMURA, YASUHIRO
分类号 G03F7/20 主分类号 G03F7/20
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