| 发明名称 |
COATING SOLUTION FOR FILM FORMATION, METHOD FOR PRODUCTION OF THE COATING SOLUTION, AND METHOD FOR PRODUCTION OF SEMICONDUCTOR DEVICE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve storage stability of a siloxane polymer-containing coating solution for film formation which has high curability but is poor in storage stability at room temperature. <P>SOLUTION: The coating solution for film formation includes a polymer having a Si-O-Si bond and a silanol group, an organic solvent represented by the formula R<SP>1</SP>(OCH<SB>2</SB>CHCH<SB>3</SB>)<SB>n</SB>OCOCH<SB>3</SB>, an organic solvent which can dissolve therein a cis-type divalent carboxylic acid, and a cis-type divalent carboxylic acid. In the formula, R<SP>1</SP>represents 1-4C alkyl group; and n represents 1 or 2. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010112966(A) |
申请公布日期 |
2010.05.20 |
| 申请号 |
JP20070058646 |
申请日期 |
2007.03.08 |
| 申请人 |
NISSAN CHEM IND LTD |
发明人 |
NAKAJIMA MAKOTO;SAKAIDA KOJI;IMAMURA HIKARI;TAKEI SATOSHI |
| 分类号 |
G03F7/11;C08K5/06;C08K5/092;C08K5/103;C08L83/06;H01L21/027;H01L21/312 |
主分类号 |
G03F7/11 |
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