发明名称 |
PROJECTION EXPOSURE APPARATUS, METHOD FOR CALIBRATING MEASUREMENT CRITERION OF DISPLACEMENT MEASUREMENT UNIT, AND METHOD FOR MANUFACTURING DEVICE |
摘要 |
A projection exposure apparatus includes an optical element, and projects a pattern formed on a first object onto a second object to be exposed through a projection optical system for correcting imaging characteristics by controlling the optical element. The projection exposure apparatus includes: a displacement measurement unit configured to measure a displacement of the optical element; a storage unit configured to store a measurement criterion of the displacement measurement unit; an imaging characteristics measurement unit configured to measure imaging characteristics of the projection optical system; and a calibration unit configured to calibrate the measurement criterion based on a result of measurement by the imaging characteristics measurement unit.
|
申请公布号 |
US2010124724(A1) |
申请公布日期 |
2010.05.20 |
申请号 |
US20090621371 |
申请日期 |
2009.11.18 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
HOSHINO TOMOHIRO;YOSHIHARA TOSHIYUKI |
分类号 |
G03F7/20;G01B11/14;G03B27/52;G03B27/54;G03B27/68 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|