发明名称 METAL-OXIDE-METAL STRUCTURE WITH IMPROVED CAPACITIVE COUPLING AREA
摘要 A stacked metal-oxide-metal (MOM) capacitor structure and method of forming the same to increase an electrode/capacitor dielectric coupling area to increase a capacitance, the MOM capacitor structure including a plurality of metallization layers in stacked relationship; wherein each metallization layer includes substantially parallel spaced apart conductive electrode line portions having a first intervening capacitor dielectric; and, wherein the conductive electrode line portions are electrically interconnected between metallization layers by conductive damascene line portions formed in a second capacitor dielectric and disposed underlying the conductive electrode line portions.
申请公布号 US2010123214(A1) 申请公布日期 2010.05.20
申请号 US20080274255 申请日期 2008.11.19
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN CHAO-CHI;KING MING-CHU;CHOU CHEN CHENG
分类号 H01L29/92;H01G4/005 主分类号 H01L29/92
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