PHOTOSENSITIVE QUANTUM DOT, COMPOSITION COMPRISING THE SAME AND METHOD FOR FABRICATING A PATTERN-INCLUDING QUANTUM DOT USING THE COMPOSITION

摘要

PURPOSE: A photosensitive quantum dot is provided to constantly maintain light emission efficiency of quantum dot-containing pattern for a long time and to enhance hardening efficiency. CONSTITUTION: A photosensitivity quantum dot comprises a quantum dot and plural photosensitive moieties which is bound to the surface of the quantum dot and contains Si and photosensitive functional group. The photosensitive moieties have chemical formula 1 or 2. A composition for forming quantum dot-containing pattern contains the photosensitive quantum dot, photoinitiator, and solvent. A method for forming the quantum dot-containing pattern comprises: a step of preparing the composition for forming quantum dot-containing pattern; a step of providing a quantum dot-containing film; a step of selectively exposing the film to the light; and a step of developing the film.