发明名称 APPLICATION METHOD AND APPARATUS FOR RESIN
摘要 An application method for resin includes applying resin to a first electronic component in an application chamber under a first internal pressure, moving a second electronic component into an internal pressure adjustment chamber under a second internal pressure which is higher than the first internal pressure and adjusting an internal pressure of the internal pressure adjustment chamber from the second internal pressure to the first internal pressure, and moving the second electronic component into the application chamber while moving the first electronic component into the internal pressure adjustment chamber after the step of application of the resin has been completed.
申请公布号 US2010122457(A1) 申请公布日期 2010.05.20
申请号 US20090617076 申请日期 2009.11.12
申请人 FUJITSU LIMITED 发明人 IKURA KAZUYUKI;UNE JUNZOU;MATSUEDA JUN
分类号 H01L21/56;H05K3/30;H05K13/04 主分类号 H01L21/56
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