| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative photosensitive composition which, when used as a resist material, can be decomposed and removed at a low temperature and ensures a very small residual amount of undecomposed components, and to provide a method for forming a conductive pattern using the negative photosensitive composition. <P>SOLUTION: The negative photosensitive composition contains a (meth)acrylated acetal resin (A) having a noncyclic acetal structural unit and a photopolymerization initiator (B), wherein the (meth)acrylated acetal resin (A) having the noncyclic acetal structural unit is a resin (A1) having a structural unit represented by general formula (1), a resin (A2) having structural units represented by general formulas (3) and (4), or a resin (A3) having structural units represented by general formulae (1), (2), (3) and (4), and the ratio of the number of carbon atoms to the number of oxygen atoms in the (meth)acrylated acetal resin (A) is 2.3-6.0. In the general formulae (1) to (4), R<SP>1</SP>, R<SP>2</SP>and R<SP>3</SP>represent a divalent organic group, and a to d represent an integer of ≥1, provided that c/d is 0.8-1.2. <P>COPYRIGHT: (C)2010,JPO&INPIT |
