| 摘要 |
<P>PROBLEM TO BE SOLVED: To efficiently evaluate the state of cross-sectional shape, etc., in an image which is to be formed in the photosensitive layer of a substrate, without having actually to expose the substrate. <P>SOLUTION: A device for exposure having a projected image evaluating device for evaluating the cross-sectional shape of the image to be formed in the photosensitive layer on a wafer W after development includes: a first operation part 22a for obtaining the contrast information of an intensity distribution of illumination light, in a direction along the front surface of the photosensitive layer; a second operation part 22b for obtaining standing wave information in the photosensitive layer, based on the reflectance of the front end in the photosensitive layer on the wafer W; and a third operation part 22c for obtaining the linewidth information of the image to be formed in the photosensitive layer after development, through the use of the contrast information to be obtained by the first operation part 22a and the standing wave information which is to be obtained by the second operation part 22b. <P>COPYRIGHT: (C)2010,JPO&INPIT |
