| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ion beam device of a single column which enables observation and processing of a sample. Ž<P>SOLUTION: This focusing ion beam device focuses the ion beam drawn out from a gas electric field ion source and irradiates it to a sample 24, and processes and observes the sample. The ion source is equipped with an emitter chip 13 which forms an ion, a heating means 15 that heats the ion, gas introduction ports 110, 112 that introduce the first gas and at least one of the second gases, and a controller 172 that switches a first emitter chip temperature and a second emitter chip temperature in order to form the ion beam of either gas. The first gas is a light gas and used for an observation mode, and the second gas of at least one is a heavy gas (inert gas, reactive gas) and used for a sputtering mode (in case of the inert gas) or a reaction mode (in case of reactive gas). Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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