| 摘要 |
A method of cleaning a substrate, and substrate cleaning apparatus, with which organic, metallic foreign matter can be effectively removed from a cleaning surface of substrate by an increase of UV ray intensity on the cleaning surface of substrate and by, resulting therefrom, increases of ozone Oconcentration, excited oxygen atom O(1D) concentration and active oxygen concentration. There is provided a method of cleaning a substrate through UV ray irradiation, characterized in that providing a second space including a surface of substrate on which cleaning is carried out (herein referred to as cleaning surface) and the vicinity thereof in which there is produced an atmosphere of liquid or gas capable of generating at least any one member selected from among ozone, excited oxygen atom and active oxygen species by irradiation with UV rays and further providing a first space including the opposite surface of the substrate (herein referred to as irradiation surface) in which there is produced an atmosphere of gas exhibiting low UV ray absorption, UV rays are transmitted through the first space so as to fall incident on the irradiation surface of the substrate and further transmitted through the interior of the substrate so as to irradiate the cleaning surface.
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