发明名称 METHOD OF ANALYZING A COMPOSITION CONTAINING IMPURITIES
摘要 A method of analyzing a composition and a method of processing the composition are provided. The composition contains impurities and has a boiling point less than ambient temperature and/or a vapor pressure greater than water at 14.5 °C. The method of analyzing the composition comprises a step of providing the composition in a liquid state within a vessel. The composition is chilled in the liquid state within the vessel at a temperature below the boiling point of the composition, thereby maintaining the composition in the liquid state. The chilled composition in the vessel is converted to produce at least one of a vaporized composition and a nebulized composition, which converted composition is introduced into an analytical device. A measurement of content of the impurities of the composition is obtained from the analytical device. The method of processing the composition includes the same steps as the method of analyzing the composition, and but further requires that at least a portion of the composition remains in the supply tank.
申请公布号 CA2744029(A1) 申请公布日期 2010.05.20
申请号 CA20092744029 申请日期 2009.11.16
申请人 HEMLOCK SEMICONDUCTOR CORPORATION 发明人 HADD, JOHN;HOLMES, RON;PUEHL, CARL
分类号 C01B33/107;G01N1/22;G01N33/00 主分类号 C01B33/107
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