| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a control technique for shortening a measurement time while preventing excessive deterioration in precision of measurement of a substrate surface position (height) and an inclination, and to provide a scanning exposure apparatus. <P>SOLUTION: A plurality of pieces of luminous flux for measurement are made incident on a plurality of measurement points on a surface of a substrate and are reflected. The plurality of measurement points are arranged over a length substantially equal to or longer than the width of an exposure slit of an exposure station in a non-scanning direction. Measurement points for measuring places within an allowable distance from upper measurement target positions on the substrate are determined among the plurality of measurement points, and surface positions of at least two shot regions are measured simultaneously. For example, measurement points 701 and 702 for measuring measurement target positions 601 and 602 in an array 613 of shot regions are determined. Further, arrays which can be measured simultaneously with the array 613 are determined for measurement target positions 603 to 612 in arrays 614 to 618. <P>COPYRIGHT: (C)2010,JPO&INPIT |
