发明名称 |
TEMPERATURE UNIFORMITY MEASUREMENT DURING THERMAL PROCESSING |
摘要 |
Methods and systems for determining a radial differential metrology profile of a substrate heated in a process chamber is provided. Methods and systems for determining an angular or azimuthal differential metrology profile of a rotating substrate in a processing chamber are also provided. The radial and azimuthal differential metrology profiles are applied to adjust a reference metrology profile to provide a Virtual metrology of the process chamber. The virtual metrology is applied to control the performance of the process chamber.
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申请公布号 |
US2010124249(A1) |
申请公布日期 |
2010.05.20 |
申请号 |
US20080273842 |
申请日期 |
2008.11.19 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ADERHOLD WOLFGANG;JALLEPALLY RAVI;RAMACHANDRAN BALASUBRAMANIAN;HUNTER AARON M.;ILIOPOULOS ILIAS |
分类号 |
G01J5/00 |
主分类号 |
G01J5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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