发明名称 STAGE FOR SUBSTRATE TEMPERATURE CONTROL APPARATUS
摘要 A stage for a substrate temperature control apparatus is provided, and with such stage, expansion of transient temperature distribution generated while heating or cooling the substrate is reduced compared with conventional stages. The stage for a substrate temperature control apparatus is to be used for placing a substrate, which has a prescribed diameter, at a prescribed position on the substrate temperature control apparatus which controls the temperature of the substrate. The stage includes a plate whereupon a step section lower than the center section is formed in a region including a position which corresponds to the edge of the substrate on a first surface facing the substrate, and a temperature control section arranged on a second surface on the side opposite to a first surface of the plate.
申请公布号 KR20100053614(A) 申请公布日期 2010.05.20
申请号 KR20107005011 申请日期 2008.12.15
申请人 KOMATSU LTD. 发明人 BANDOH KENICHI;SASAKI JUN
分类号 H01L21/02;H05B3/68 主分类号 H01L21/02
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