| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which, when used as a resist material, can be decomposed and removed at a low temperature and ensures a very small residual amount of undecomposed components, and a method for forming an electrically conductive pattern using the positive photosensitive composition. <P>SOLUTION: The positive photosensitive composition contains a resin (A) having a noncyclic acetal structural unit of a specific structure and a photoacid generator (B), wherein the ratio of the number of carbon atoms to the number of oxygen atoms in the resin (A) having the noncyclic acetal structural unit of a specific structure is 2.3-6.0. <P>COPYRIGHT: (C)2010,JPO&INPIT |
