| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer for an underlayer film, wherein a film effectively preventing reflection upon exposure and having a smooth surface even when the polymer is applied on a substrate having a step-like profile, is formed, and intermixing with a resist to be applied on the upper layer is suppressed and an exposed part can be easily removed with an alkali developer solution. <P>SOLUTION: The polymer for the underlayer film includes a crosslinked polymer containing at least repeating structural unit that includes two or more polymer chains bonded with a linking group including a functional group which can be cut by an action of an acid and that includes a light-absorbing group, wherein the functional group which can be cut by an action of an acid preferably includes an acetal structure. <P>COPYRIGHT: (C)2010,JPO&INPIT |
