EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING A DEVICE

摘要

PURPOSE: An exposure method, an exposure apparatus and a method for manufacturing a semiconductor device are provided to improve the quality of the semiconductor device by preventing the accumulation of process errors. CONSTITUTION: An exposure apparatus(10) exposures substrates(31) which are through a process apparatus. Mask patterns are transferred to the substrates. The process apparatus processes identical process with a plurality of processing units. An alignment unit arranges a plurality mark detectors on different positions. The mark detectors detect marks of the substrates.