| 摘要 |
<p>A method of removing any foreign matter strongly adhering to a surface of glass substrate without increasing of the surface roughness of the glass substrate over the entirety of the substrate surface. There is provided a method of removing any foreign matter from a surface of glass substrate, characterized by including the steps of irradiating the surface of glass substrate around a site where the foreign matter lies with high energy beams so as to generate a stress attributed to a structural change of the material constituting the glass substrate around the site irradiated with high energy beams; and wet etching the surface of the glass substrate after the irradiation with high energy beams.</p> |
