发明名称 LITHOGRAPHY SYSTEM AND LITHOGRAPHY METHOD
摘要 <p>PURPOSE: A lithography system and a lithography method are provided to obtain a microstructure with a high resolution by transferring modulated light along the flow of a photo-curable fluid. CONSTITUTION: A photo-curable fluid flows through a microfluidic channel(110). A light projection unit supplies light which is transferred along the flow of the photo-curable fluid to the microfluidic channel. The light projection unit includes light source(160) and a spatial light modulator(150). The spatial light modulator modulates light from the light source. The speed of the light is the same as the speed of the photo-curable fluid.</p>
申请公布号 KR20100053097(A) 申请公布日期 2010.05.20
申请号 KR20080112077 申请日期 2008.11.12
申请人 SNU R&DB FOUNDATION 发明人 KWON, SUNG HOON;PARK, HYUN SUNG;YU, KYOUNG SIK;PARK, NAM KYOO
分类号 H01L21/027 主分类号 H01L21/027
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