发明名称 |
LITHOGRAPHY SYSTEM AND LITHOGRAPHY METHOD |
摘要 |
<p>PURPOSE: A lithography system and a lithography method are provided to obtain a microstructure with a high resolution by transferring modulated light along the flow of a photo-curable fluid. CONSTITUTION: A photo-curable fluid flows through a microfluidic channel(110). A light projection unit supplies light which is transferred along the flow of the photo-curable fluid to the microfluidic channel. The light projection unit includes light source(160) and a spatial light modulator(150). The spatial light modulator modulates light from the light source. The speed of the light is the same as the speed of the photo-curable fluid.</p> |
申请公布号 |
KR20100053097(A) |
申请公布日期 |
2010.05.20 |
申请号 |
KR20080112077 |
申请日期 |
2008.11.12 |
申请人 |
SNU R&DB FOUNDATION |
发明人 |
KWON, SUNG HOON;PARK, HYUN SUNG;YU, KYOUNG SIK;PARK, NAM KYOO |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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