发明名称 PHOTOSENSITIVE PASTE COMPOSITION AND PATTERN FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive paste composition which is inexpensive and capable of forming a thin-film, low-resistivity, and high-definition pattern on a glass substrate. <P>SOLUTION: In this photosensitive paste composition and the pattern forming method using this composition, the photosensitive paste composition contains (A1) flake shaped aluminum powders within a range in which a 50 wt.%-particle diameter is 2.0-20.0 &mu;m and the average thickness is 0.1-1.0 &mu;m, (C) an alkaline soluble resin, (D) polyfunctional (meth)acrylate, and (E) a photo-polymerization initiator. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010114075(A) 申请公布日期 2010.05.20
申请号 JP20090233228 申请日期 2009.10.07
申请人 JSR CORP 发明人 KUDO KAZUO;YAMASHITA TAKANORI
分类号 H01B1/22;G03F7/004;H01B1/00;H01B13/00;H01J9/02;H01J11/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34 主分类号 H01B1/22
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