| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treatment agent for semiconductor substrate, which is used when cleaning and drying a substrate while preventing collapse of a pattern. SOLUTION: The surface treatment agent for semiconductor substrate is supplied to a plurality of convex patterns formed on a semiconductor substrate, each of the convex patterns at least partially having a silicon-containing film, and having hydroxy group on a surface thereof by cleaning and modifying the surface, wherein the surface treatment agent includes a hydrolytic group reactable with the hydroxy group, and forms a water repellent protective film lower in wettability to water than the silicon-containing film on the surface of the silicon-containing film. COPYRIGHT: (C)2010,JPO&INPIT
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