| 发明名称 |
ZINC OXIDE BASED SPUTTERING TARGET, METHOD FOR MANUFACTURING ZINC OXIDE BASED SPUTTERING TARGET, ZINC OXIDE BASED TRANSPARENT ELECTRICALLY CONDUCTIVE FILM, METHOD FOR MANUFACTURING ZINC OXIDE BASED TRANSPARENT ELECTRICALLY CONDUCTIVE FILM, AND ELECTRONIC APPARATUS |
| 摘要 |
A method for manufacturing a zinc oxide based sputtering target includes the step of producing a zinc oxide based sputtering target by using γ-Al2O3 as a dopant material.
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| 申请公布号 |
US2010123103(A1) |
申请公布日期 |
2010.05.20 |
| 申请号 |
US20090621176 |
申请日期 |
2009.11.18 |
| 申请人 |
SONY CORPORATION |
发明人 |
KIRITA SHINA;KAWASHIMA TOSHITAKA;NAGATA TAKAHIRO;KAMORI YUICHI |
| 分类号 |
C23C14/38;C23C14/34;H01B1/02 |
主分类号 |
C23C14/38 |
| 代理机构 |
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代理人 |
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| 地址 |
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