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发明名称
Verfahren zum Herstellen einer dielektrischen Zwischenschicht und Verfahren zum Herstellen eines Speicherkondensators
摘要
申请公布号
DE102006024214(B4)
申请公布日期
2010.05.20
申请号
DE200610024214
申请日期
2006.05.23
申请人
QIMONDA AG
发明人
HINTZE, BERND;BERNHARDT, HENRY;BERNHARDT, FRANK
分类号
H01L21/8242;H01L27/108
主分类号
H01L21/8242
代理机构
代理人
主权项
地址
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