PHOTHLITHOGRAPHY SOLUTION SUPPLYING DEVICE OF WAFER AND THEREOF METHOD

摘要

PURPOSE: A supply apparatus and method of an etching solution for a semiconductor are provided to prevent an etching failure during a wafer etching process by regulating the injection pressure of the etching solution based on the etching part of a wafer. CONSTITUTION: A cylindrical process chamber(1) is prepared. A pin head rotates a wafer(W). An etching solution which is supplied from a supply unit is injected through a nozzle(3). A pressure regulator(7) regulates the injection pressure of the etching solution based on the etching location of wafer. The pressure for the center part of the wafer is different from the peripheral part of the wafer.