发明名称 |
SEMICONDUCTOR LASER ELEMENT, AND SEMICONDUCTOR LASER ELEMENT MANUFACTURING METHOD |
摘要 |
A semiconductor laser element 1 according to the present invention includes a window region 23 including a disordered portion formed by diffusion of a group-III vacancy, and a non-window region 24 including an active layer 15 of a quantum well structure, and has the disordered portion formed by providing on the window region 23 a promoting film that absorbs a predetermined atom and promotes the diffusion of group-III vacancy. An impurity that preferentially substitutes a group-V site is doped in a layer near the active layer 15, and a difference between an energy band gap in the window region and an energy band gap in the non-window region is equal to or larger than 50 meV. |
申请公布号 |
EP2187488(A1) |
申请公布日期 |
2010.05.19 |
申请号 |
EP20070806686 |
申请日期 |
2007.09.04 |
申请人 |
THE FURUKAWA ELECTRIC CO., LTD. |
发明人 |
TANIGUCHI, HIDEHIRO;ISHII, HIROTATSU;NAMEGAYA, TAKESHI |
分类号 |
H01S5/16 |
主分类号 |
H01S5/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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