发明名称 Methods for forming wiring and electrode
摘要 <p>There is provided a method for forming wiring or an electrode by coating a substrate with a composition comprising (A) a complex of an amine compound and a hydrogenated aluminum compound and (B) a titanium compound or a composition comprising the complex and (C) metal particles and subjecting the obtained coating film to heating and/or a light treatment. By the method, a film can be formed that uses a conductive film forming composition with which wiring and an electrode that can be suitably used for electronic devices can be formed easily and inexpensively.</p>
申请公布号 EP1462544(B1) 申请公布日期 2010.05.19
申请号 EP20040007238 申请日期 2004.03.25
申请人 JSR CORPORATION;SHARP CORPORATION 发明人 YOKOYAMA, YASUAKI;YONEKURA, ISAMU;SATOH, TAKASHI;WAKASAKI, TAMAKI;TAKEUCHI, YASUMASA;ENDO, MASAYUKI
分类号 C23C18/02;H01B1/22;C23C18/06;C23C18/08;C23C18/10;C23C18/14;H01L21/288 主分类号 C23C18/02
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