发明名称 P-type field-effect transistor and method of production
摘要 An n-layer (3) is arranged above a substrate (1), which can be GaAs, and a p-layer (4) is arranged on the n-layer. The p-layer is separated by a gate electrode (10) into two separate portions forming source and drain. The gate electrode is insulated from the semiconductor material by a gate dielectric (6). Source/drain contacts (11) are electrically conductively connected with the portions of the p-layer.
申请公布号 EP2187432(A1) 申请公布日期 2010.05.19
申请号 EP20080169044 申请日期 2008.11.13
申请人 EPCOS AG 发明人 VAN DEN OEVER, LEON C. M.
分类号 H01L21/336;H01L21/8252;H01L27/06;H01L29/20;H01L29/205;H01L29/423 主分类号 H01L21/336
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