发明名称 |
P-type field-effect transistor and method of production |
摘要 |
An n-layer (3) is arranged above a substrate (1), which can be GaAs, and a p-layer (4) is arranged on the n-layer. The p-layer is separated by a gate electrode (10) into two separate portions forming source and drain. The gate electrode is insulated from the semiconductor material by a gate dielectric (6). Source/drain contacts (11) are electrically conductively connected with the portions of the p-layer.
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申请公布号 |
EP2187432(A1) |
申请公布日期 |
2010.05.19 |
申请号 |
EP20080169044 |
申请日期 |
2008.11.13 |
申请人 |
EPCOS AG |
发明人 |
VAN DEN OEVER, LEON C. M. |
分类号 |
H01L21/336;H01L21/8252;H01L27/06;H01L29/20;H01L29/205;H01L29/423 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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