发明名称 |
PROXIMITY EXPOSURE APPARATUS, METHOD OF DELIVERING A MASK OF A PROXIMITY EXPOSURE APPARATUS AND METHOD OF MANUFACTURING A DISPLAY PANEL SUBSTRATE |
摘要 |
<p>PURPOSE: A proximity exposure apparatus, a method for transferring the mask of the same and a method for manufacturing a display panel substrate are provided to improve the quality of the display panel substrate by precisely performing the mask location determining process and a pattern transferring process. CONSTITUTION: A first control unit controls the transfer of a stage. A mask is loaded on a chuck(10) by a mask transfer unit. A plurality of push-up units includes a motor(11) in order to elevate push-up pins. A first image pick-up unit takes an image of a mark on a mask and outputs image signal. A transferring unit transfers the first image pick-up unit. An image process unit processes the image signal and detects the location of the mask.</p> |
申请公布号 |
KR20100052403(A) |
申请公布日期 |
2010.05.19 |
申请号 |
KR20090089006 |
申请日期 |
2009.09.21 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
MORI JUNICHI;MATSUYAMA KATSUAKI;HIKAWA HIROSHI |
分类号 |
H01L21/027;H01L21/677;H01L21/68 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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