| 摘要 |
It is to provide a star polymer that can be used as a photoresist material of photolithography processing with no linear polymer remained. After forming the core part by producing a polymer by polymerizing one or more polyfunctional (meth)acrylic acid ester derivative represented by formula (IV)
(wherein R represents a hydrogen atom, etc. , n represents 2 or 3, and A represents an organic group linking at a carbon atom) by anionic polymerization in an organic solvent, in the presence of 0.1 to 0.99 mol of organic alkali metal compound with respect to 1 mol of the compound of the formula (IV), and in the presence of 0.1 to 20 mol of inorganic salts of alkali metal or alkali earth metal with respect to 1 mol of the organic alkali metal compound, the arm part is formed by polymerizing one or more monofunctional (meth)acrylic acid ester derivative represented by formula (I)
(wherein R 1 represents a hydrogen atom, etc., and R 2 represents an organic group) by anionic polymerization from the anionic active site of the core part.
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