发明名称 Method and apparatus for detecting pattern defects
摘要 With the objective of achieving defect kind training in a short period of time to teach classification conditions of defects detected as a result of inspecting a thin film device, according to one aspect of the present invention, there is provided a visual inspection method, and an apparatus therefore, comprising the steps of: detecting defects based on inspection images acquired by optical or electronic defect detection means, and at the same time calculating features of the defects; and classifying the defects according to classification conditions set beforehand, wherein said classification condition setting step further includes the steps of: collecting defect features over a large number of defects acquired beforehand from the defect detection step; sampling defects based on the distribution of the collected defect features over the large number of defects; and setting defect classification conditions based on the result of reviewing the sampled defects.
申请公布号 US7720275(B2) 申请公布日期 2010.05.18
申请号 US20050319271 申请日期 2005.12.29
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SHIBUYA HISAE;HAMAMATSU AKIRA;TAKAGI YUJI
分类号 G06K9/00;G06K9/62 主分类号 G06K9/00
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