A new ruthenium compound and vapor deposition method using the same,申请号KR20080008349-传众专利搜索

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发明名称	A new ruthenium compound and vapor deposition method using the same
摘要
申请公布号	KR100958332(B1)	申请公布日期	2010.05.18
申请号	KR20080008349	申请日期	2008.01.28
申请人		发明人
分类号	C07F15/00;C23C16/18;H01L21/20	主分类号	C07F15/00
代理机构		代理人
主权项
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