发明名称 Structures and methods for fabricating vertically integrated HBT-FET device
摘要 Methods and systems for fabricating integrated pairs of HBT/FET's are disclosed. One preferred embodiment comprises a method of fabricating an integrated pair of GaAs-based HBT and FET. The method comprises the steps of: growing a first set of epitaxial layers for fabricating the FET on a semi-insulating GaAs substrate; fabricating a highly doped thick GaAs layer serving as the cap layer for the FET and the subcollector layer for the HBT; and producing a second set of epitaxial layers for fabricating the HBT.
申请公布号 US7718486(B2) 申请公布日期 2010.05.18
申请号 US20060331630 申请日期 2006.01.13
申请人 发明人 KRUTKO OLEH;XIE KEZHOU;SHOKRANI MOHSEN;GUPTA ADITYA;GEDZBERG BORIS
分类号 H01L21/8249;H01L27/06;H01L29/739 主分类号 H01L21/8249
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