发明名称 Substrate heat treatment apparatus
摘要 A heat-treating plate has, arranged on the upper surface thereof, support elements for supporting a substrate, and a first sealer for closing lateral areas of a first space formed between the heat-treating plate and the substrate supported. Further, second sealers ring-shaped in plan view are arranged around openings of perforations accommodating transfer pins. The second sealers close lateral areas of second spaces opposed to the perforations. Gastightness of the first space excluding the second spaces is never impaired through the perforations. By exhausting gas from the first space through exhaust bores, the substrate is effectively sucked for heat treatment.
申请公布号 US7718925(B2) 申请公布日期 2010.05.18
申请号 US20060566507 申请日期 2006.12.04
申请人 DAINIPPON SCREEN MFG. CO., LTD. 发明人 GOTO SHIGEHIRO;MATSUCHIKA KEIJI
分类号 H01L21/68;H05B3/22 主分类号 H01L21/68
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